Intel posts video showing the arrival and installation of its cutting-edge High-NA lithography machine.

ASML on Thursday announced that it had begun shipping the industry's first extreme ultraviolet (EUV) lithography tool with a 0.55 numerical aperture (High-NA) to Intel.

ASML's backlog in China totals tens of billions of dollars, but geopolitical tensions could impact the company's ability to fulfill it.

Intel says ASML's High-NA EUV tools have produced 30,000 wafers in a single quarter.

ASML appears to have accelerated its ambitious expansion plans in the Netherlands. The site may be in action up to two years early.

Dutch government continues to grant ASML export license to ship litho tools to Chinese customers, but raises concerns about military and economic risks.

The Chip War is fought over ideology, not factual basis, says tech boss

The Netherlands expands its export controls on measuring and inspection equipment to ensure that ASML applies for licenses locally, not in the U.S.

The Dutch government may ban ASML from servicing high-end wafer fab tools in China, but the outgoing ASML CEO says this will not be a major problem for earnings.

ASML and Imec successfully demonstrate high-resolution patterning using High-NA EUV tools.

Russia to develop lithography systems that could compete against ASML's Twinscan NXE EUV systems.

TSMC asks to delay delivery of chipmaking tools because of demand uncertainties and Fab 21 setback.

ASML mulls Hyper-NA lithography with a higher than 0.7 numerical aperture in 2030s.

Intel is gearing up to be high-NA EUV lithography champ with orders for six additional Twinscan EXE machines.

Russian companies get spare parts for ASML's PAS 5500 lithography steppers from 1990s – 2000s through China-based intermediaries.

Corning introduces new Extreme ULE glass for photomasks and mirrors to be used with next-generation EUV and High-NA EUV tools.

Pat Gelsinger is back in the semiconductor game with xLight, a company that plans to make an EUV light source using a collider.

Tech could lower manufacturing costs by simplifying one of the most complex steps in chip production and 3D chip integration.

TSMC to start installing High-NA EUV system for R&D purposes this month.

A Russian engineer is accused of leaking confidential technical data from ASML, NXP, TSMC, and GlobalFoundries to Russia, allegedly to support construction of a 28nm-capable fab.

Shanghai Microelectronics Equipment patents key components of an EUV lithography tool.

Intel Foundry announced it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon.

Chinese companies aggressively recruiting personnel from ASML and Zeiss to build their own wafer fabbing equipment.

Shanghai Micro Electronics Equipment Group could start selling a 28nm-capable lithography tool by end of 2023.

Rapidus gets ASML's Twinscan NXE:3800E, almost completes its installation.

China wants the Dutch government not to impose new export rules that ban sales of advanced DUV tools to the People's Republic.

The U.S. government approves shipments of wafer fab equipment to many Chinese fabs, other are banned. Question is, can those tools be installed in banned fabs?

Shanghai Micro Electronics Equipment Group claims to have developed a 28nm-capable lithography machine for chip manufacturing, a breakthrough for the Chinese tech industry.

Canon's nanoimprint lithography tools will ship either this year or next, they will address 3D NAND manufacturing first.

Chinese companies accelerate procurement of ASML's litho tools in January and February.